Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
| Line 503: | Line 503: | ||
In order to get good alignment, it is advised to use four alignment marks for alignment, and to activate the scaling (possibly also shearing) function before starting the exposure. | In order to get good alignment, it is advised to use four alignment marks for alignment, and to activate the scaling (possibly also shearing) function before starting the exposure. | ||
An error of 10 ppm (scaling = 1.000010 or 0.999990; shearing = ±0.010 mRad) corresponds to | An error of 10 ppm (scaling = 1.000010 or 0.999990; shearing = ±0.010 mRad) corresponds to a difference of 1µm from one edge to another of a 4" wafer. | ||
'''Alignment accuracy:''' | '''Alignment accuracy:''' | ||