Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions

Revision as of 07:21, 15 April 2020 view source Taran (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891 3,528 edits →Advanced Field alignment (TSA) ← Older edit		Revision as of 07:35, 16 April 2020 view source Taran (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891 3,528 edits →Process Parameters Newer edit →
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	'''AZ nLOF 2020''' has also been tested. It seems to work even at 405nm, but the dose is so ~~hign~~ (>10000) that exposure would be slower than Aligner: Maskless 02.		'''AZ nLOF 2020''' has also been tested. It seems to work even at 405nm, but the dose is so high (>10000) that exposure would be slower than Aligner: Maskless 02.

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