Specific Process Knowledge/Characterization/XPS/K-Alpha

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The XPS K-Alpha

Name: XPS K-Alpha
Vendor: Thermofisher
The XPS K-Alpha allows you to analyse a broad range of samples with the XPS technique.

The user manual(s), user APV(s), technical information and contact information are be found in LabManager:

XPS K-Alpha in LabManager

The position of the K-Alpha had to be rotated 90 degrees to make room for the XPS Nexsa in 2019.

Process information

The XPS instrument enables elemental analysis, chemical state analysis on the sample surface or deeper down by a depth profiling. A comparison about techniques and instruments used for elemental analysis at DTU Nanolab can be found on the page Element analysis.

More about the different possibilities of the XPS instrument is found here:

• The XPS technique
• Elemental analysis
• Chemical sensitivity
• Depth profiling
• Carbon contamination

• Links to external material

Getting access to the XPS

Click HERE to see information on how to get access to the XPS.

Performance of XPS K-Alpha

Purpose	Chemical analysis	Probing elemental composition Chemical state identification Non destructive technique Surface sensitive Depth profiling possible by ion beam etch of sample
Performance	Spot size	Can be set between 30µm - 400µm
	Probing depth	Depending on probed element. Max probe depth lies within 10-200 Å.
	Resolution	Dependent on probed elements. Concentrations down to about 0,5 atomic % can in some cases be detected.
	Charge compensation	Flood gun can be used for charge compensation of non conductive samples
	Finding structures	Choose measuring spot from camera image (magnified)
Depth profiling	Purpose	With ion beam etch the top layer of the material can be removed, to do a depth profiling
	Ion beam size	About 3x1 mm
Substrates	Substrate size	Maximum 60x60 mm
	Substrate thickness	Maximum height about 20 mm