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== Deposition of Titanium Nitride ==
== Deposition of Titanium Nitride ==


Thin films of titanium nitride can be deposited by [[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)|ALD]] and [[Specific Process Knowledge/Thin film deposition/Lesker|sputtering]] methods.  
Thin films of Titanium Nitride (TiN) can be deposited by either [[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)|ALD]] or [[Specific Process Knowledge/Thin film deposition/Lesker|sputtering]] methods.  


Information about the ALD process can be found [[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/TiN deposition using ALD2|here]].
Information about the ALD process can be found [[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/TiN deposition using ALD2|here]].


Information about the sputtering process can be found [[Specific Process Knowledge/Thin film deposition/Deposition of Titanium Nitride/Deposition of Titanium Nitride using Lesker sputter tool|here]].
Information about the sputtering method can be found [[Specific Process Knowledge/Thin film deposition/Deposition of Titanium Nitride/Deposition of Titanium Nitride using Lesker sputter tool|here]].


==Comparison between sputtering and ALD methods for deposition of Titanium Nitride.==
==Comparison between sputtering and ALD methods for deposition of Titanium Nitride.==
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