Jump to content

Specific Process Knowledge/Thin film deposition/Deposition of Titanium Nitride: Difference between revisions

Eves (talk | contribs)
Eves (talk | contribs)
Line 6: Line 6:
== Deposition of Titanium nitride ==
== Deposition of Titanium nitride ==


Thin films of titanium nitride can be deposited by [[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)|ALD]] and [[Specific Process Knowledge/Thin film deposition/Lesker|sputering]] methods.  
Thin films of titanium nitride can be deposited by [[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)|ALD]] and [[Specific Process Knowledge/Thin film deposition/Lesker|sputtering]] methods.  


Information about the ALD process can be found [[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/TiN deposition using ALD2|here]].
Information about the ALD process can be found [[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/TiN deposition using ALD2|here]].