Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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= Development = | = Development = | ||
There are many different developers for different E-beam resist, but since CSAR and ZEP520A are the most used at Nanolab, we have installed a semi automatic puddle developer: '''[[Specific_Process_Knowledge/Lithography/ | There are many different developers for different E-beam resist, but since CSAR and ZEP520A are the most used at Nanolab, we have installed a semi automatic puddle developer: '''[[Specific_Process_Knowledge/Lithography/Development#Developer:_E-beam|Developer E-beam]]''' in E-4. | ||
To accommodate most users, this tool uses developers: AR 600-546 for development of CSAR 6200 resist series and ZED N-50 for ZEP520A resists and IPA as a rinsing step. | To accommodate most users, this tool uses developers: AR 600-546 for development of CSAR 6200 resist series and ZED N-50 for ZEP520A resists and IPA as a rinsing step. | ||