Specific Process Knowledge/Thin film deposition/Lesker: Difference between revisions
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!style="background:silver; color:black" align="left" valign="top" rowspan="2"|Performance | !style="background:silver; color:black" align="left" valign="top" rowspan="2"|Performance | ||
|style="background:LightGrey; color:black"|Film thickness||style="background:WhiteSmoke; color:black"| | |style="background:LightGrey; color:black"|Film thickness||style="background:WhiteSmoke; color:black"| | ||
* | *Material dependent but generally up to hundreds of nm | ||
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|style="background:LightGrey; color:black"|Deposition rates | |style="background:LightGrey; color:black"|Deposition rates | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* | *See [[#Relative Sputter rates |table]] below | ||
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!style="background:silver; color:black" align="left" valign="top" rowspan="3"|Process parameter range | !style="background:silver; color:black" align="left" valign="top" rowspan="3"|Process parameter range | ||