Specific Process Knowledge/Etch/DryEtchProcessing/LEP: Difference between revisions
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==LASER Endpoint System== | ==LASER Endpoint System== | ||
The LASER Endpoint System LEP400 can be used for finding end point during plasma etching. | |||
It sends in LASER light through a top view port on the etch chamber down on the sample. | |||
Revision as of 08:45, 25 March 2020
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LASER Endpoint System
The LASER Endpoint System LEP400 can be used for finding end point during plasma etching. It sends in LASER light through a top view port on the etch chamber down on the sample.