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==LASER Endpoint System==
==LASER Endpoint System==
The LASER Endpoint System LEP400 can be used for finding end point during plasma etching.
It sends in LASER light through a top view port on the etch chamber down on the sample.
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DryEtchProcessing/LEP"