Template:SEM comparison table 314: Difference between revisions
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*X Ray Analysis with EDS | *X Ray Analysis with EDS | ||
*Crystallographic analysis using EBSD and both On and Off axis TKD | *Crystallographic analysis using EBSD and both On and Off axis TKD | ||
* In-situ experiments with Heating and Gas injection | |||
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*Conductive samples in High Vac | *Conductive samples in High Vac | ||
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*Conductive samples in High Vac | *Conductive samples in High Vac | ||
*Charge reduction in Low Vac | *Charge reduction in Low Vac | ||
*X Ray Analysis with EDS and WDS | |||
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*Conductive samples in High Vac | *Conductive samples in High Vac | ||
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** > 12nm at 3kV (SE) --> | ** > 12nm at 3kV (SE) --> | ||
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*High Vacuum operation: | *High Vacuum operation in Mode II: | ||
**1.0 nm at 15 kV (TLD detector and optimum working distance) | **1.0 nm at 15 kV (TLD detector and optimum working distance) | ||
**1.8 nm at 1 kV (TLD detector and optimum working distance) | **1.8 nm at 1 kV (TLD detector and optimum working distance) | ||
*Low Vacuum operation: | *Low Vacuum operation in Mode II: | ||
**1.5 nm at 10 kV (Helix detector and optimum working distance) | **1.5 nm at 10 kV (Helix detector and optimum working distance) | ||
**1.8 nm at 3 kV (Helix detector and optimum working distance) | **1.8 nm at 3 kV (Helix detector and optimum working distance) | ||
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**3.0 nm at 3 kV (SE) | **3.0 nm at 3 kV (SE) | ||
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* Electron Column | * Electron Column Operation in Mode II | ||
**0.8nm @15kV | **0.8nm @15kV | ||
**0.9nm @1kV | **0.9nm @1kV | ||