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Line 150: |
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| Other studies on metals (NiFe/MnIr) show only limited effect of the substrate bias on the roughness. | | Other studies on metals (NiFe/MnIr) show only limited effect of the substrate bias on the roughness. |
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| ===From SiO2 target (RF sputter)===
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| {| {{table}} border="1" cellspacing="0" cellpadding="8"
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| | align="center" style="background:#f0f0f0;"|'''Wafer nr'''
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| | align="center" style="background:#f0f0f0;"|'''RF bias (W)'''
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| | align="center" style="background:#f0f0f0;"|'''Reactive O2 (%)'''
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| | align="center" style="background:#f0f0f0;"|'''Power(W)'''
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| | align="center" style="background:#f0f0f0;"|'''Rq (RMS) (nm)'''
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| | align="center" style="background:#f0f0f0;"|'''Thickness'''
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| |-
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| | 3||0||0||157||0.902||
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| |-
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| | 6||5||0||157||0.499||44
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| |-
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| | 7||10||0||157||0.142||42
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| |-
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| | 8||15||0||157||0.422||40
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| |-
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| |}
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