Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
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|DI water | |DI water | ||
|Acetone | |Acetone | ||
|Mask aligner: | | | ||
Mask aligner: | |||
[[media:Process_Flow_AZ5214E_pos_vers2.docx |Process_Flow_AZ5214_pos.docx]] | [[media:Process_Flow_AZ5214E_pos_vers2.docx |Process_Flow_AZ5214_pos.docx]] | ||
[[media:Process_Flow_AZ5214E_rev_vers2.docx |Process_Flow_AZ5214_rev.docx]] | [[media:Process_Flow_AZ5214E_rev_vers2.docx |Process_Flow_AZ5214_rev.docx]] | ||
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|DI water | |DI water | ||
|Acetone | |Acetone | ||
|Mask aligner: | | | ||
Mask aligner: | |||
[[media:Process_Flow_thick_AZ4562_vers2.docx|Process_Flow_thick_AZ4562.docx]] | [[media:Process_Flow_thick_AZ4562_vers2.docx|Process_Flow_thick_AZ4562.docx]] | ||
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Manual spin coater ([[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|LabSpin]] or [[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|RCD8]]) | Manual spin coater ([[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|LabSpin]] or [[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|RCD8]]) | ||
|Mask aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6_-_2|MA6 - 2]]) | | | ||
Mask aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6_-_2|MA6 - 2]]) | |||
Maskless aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_01|01]], [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_02|02]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_03|03]]) | Maskless aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_01|01]], [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_02|02]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_03|03]]) | ||
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|DI water | |DI water | ||
|Remover 1165 | |Remover 1165 | ||
|Mask aligner: | | | ||
Mask aligner: | |||
[[media:Process_Flow_AZ_MiR701.docx|Process_Flow_AZ_MiR701.docx]] | [[media:Process_Flow_AZ_MiR701.docx|Process_Flow_AZ_MiR701.docx]] | ||
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Manual spin coater ([[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|LabSpin]] or [[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|RCD8]]) | Manual spin coater ([[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|LabSpin]] or [[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|RCD8]]) | ||
|Mask aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6_-_2|MA6 - 2]]) | | | ||
Mask aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6_-_2|MA6 - 2]]) | |||
Maskless aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_01|01]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_02|02]]) | Maskless aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_01|01]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_02|02]]) | ||
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|DI water | |DI water | ||
|Remover 1165 | |Remover 1165 | ||
|Mask aligner: | | | ||
Mask aligner: | |||
[[media:Process_Flow_AZ_nLOF_2020.docx|Process_Flow_AZ_nLOF_2020.docx]] | [[media:Process_Flow_AZ_nLOF_2020.docx|Process_Flow_AZ_nLOF_2020.docx]] | ||
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|[[media:SU-8_DataSheet_2005.pdf|SU-8_DataSheet_2005.pdf]], [[media:SU-8_DataSheet_2075.pdf|SU-8_DataSheet_2075.pdf]] | |[[media:SU-8_DataSheet_2005.pdf|SU-8_DataSheet_2005.pdf]], [[media:SU-8_DataSheet_2075.pdf|SU-8_DataSheet_2075.pdf]] | ||
|Manual spin coater ([[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|LabSpin]] or [[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|RCD8]]) | |Manual spin coater ([[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|LabSpin]] or [[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|RCD8]]) | ||
|Mask aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6_-_2|MA6 - 2]]) | | | ||
Mask aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6_-_2|MA6 - 2]]) | |||
Maskless aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_01|01]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_02|02]]) | Maskless aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_01|01]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_02|02]]) | ||