Specific Process Knowledge/Characterization/XRD: Difference between revisions
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*The [[/XRD_SmartLab|Rigaku SmartLab]] primarily for thin film analysis | *The [[/XRD_SmartLab|Rigaku SmartLab]] primarily for thin film analysis | ||
*The [[/XRD_Powder|XRD Powder setup]] primarily for analysis of bulk materials and powders | *The [[/XRD_Powder|XRD Powder setup]] primarily for analysis of bulk materials and powders | ||
==Comparison of the XRDs at Nanolab== | |||
{| border="2" cellspacing="0" cellpadding="2" | |||
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | |||
|style="background:WhiteSmoke; color:black"|<b>XRD SmartLab</b> | |||
|style="background:WhiteSmoke; color:black"|<b>XRD Powder</b> | |||
|- | |||
!style="background:silver; color:black;" align="center" width="60"|Purpose | |||
|style="background:LightGrey; color:black"| Crystal structure analysis and thin film thickness measurement | |||
|style="background:WhiteSmoke; color:black"| | |||
*Phase ID | |||
*Crystal Size | |||
*Crystallinity | |||
*Quality and degree of orientation | |||
*3D orientation | |||
*Latice strain | |||
*Composition | |||
*Twist | |||
*3D lattice constant | |||
*Thickness | |||
*Roughness | |||
*Density | |||
|style="background:WhiteSmoke; color:black"| | |||
*Phase ID | |||
*Crystal Size | |||
*Crystallinity | |||
|- | |||
!style="background:silver; color:black" align="center" valign="center" rowspan="6"|X-ray generator | |||
|style="background:LightGrey; color:black"| | |||
Maximum rated output | |||
|style="background:WhiteSmoke; color:black"| | |||
3 kW | |||
|style="background:WhiteSmoke; color:black"| | |||
600 W | |||
|- | |||
|style="background:LightGrey; color:black"| | |||
Rated tube voltage | |||
|style="background:WhiteSmoke; color:black"| | |||
20 to 45 kV | |||
|style="background:WhiteSmoke; color:black"| | |||
40 kV | |||
|- | |||
|style="background:LightGrey; color:black"| | |||
Rated tube current | |||
|style="background:WhiteSmoke; color:black"| | |||
2 to 60 mA | |||
|style="background:WhiteSmoke; color:black"| | |||
15 mA | |||
|- | |||
|style="background:LightGrey; color:black"| | |||
Type | |||
|style="background:WhiteSmoke; color:black"| | |||
Sealed tube | |||
|style="background:WhiteSmoke; color:black"| | |||
Sealed tube | |||
|- | |||
|style="background:LightGrey; color:black"| | |||
Target | |||
|style="background:WhiteSmoke; color:black"| | |||
Cu | |||
|style="background:WhiteSmoke; color:black"| | |||
Cu | |||
|- | |||
|style="background:LightGrey; color:black"| | |||
Focus size | |||
|style="background:WhiteSmoke; color:black"| | |||
0.4 mm x 8 mm (Line/Point) | |||
|style="background:WhiteSmoke; color:black"| | |||
0.4 mm x 12 mm (Line) | |||
|- | |||
!style="background:silver; color:black" align="center" valign="center" rowspan="5"|Goniometer | |||
|style="background:LightGrey; color:black"| | |||
Scanning mode | |||
|style="background:WhiteSmoke; color:black"| | |||
incident / receiver coupled or independent | |||
|style="background:WhiteSmoke; color:black"| | |||
incident / receiver coupled | |||
|- | |||
|style="background:LightGrey; color:black"| | |||
Goniomenter radius | |||
|style="background:WhiteSmoke; color:black"| | |||
300 mm | |||
|style="background:WhiteSmoke; color:black"| | |||
145 mm | |||
|- | |||
|style="background:LightGrey; color:black"| | |||
Minimum step size | |||
|style="background:WhiteSmoke; color:black"| | |||
0.0001° (0.36") | |||
|style="background:WhiteSmoke; color:black"| | |||
0.001° (3.6") | |||
|- | |||
|style="background:LightGrey; color:black"| | |||
Sample stage | |||
|style="background:WhiteSmoke; color:black"| | |||
*χ:-5~+95° | |||
*φ:0~360° | |||
*Z:-4~+1 mm | |||
*X,Y:±50 mm for a 100 mm wafer | |||
*Rx,Ry:-5~+5° | |||
|style="background:WhiteSmoke; color:black"| | |||
Fixed with rotation | |||
|- | |||
|style="background:LightGrey; color:black"| | |||
Sample size | |||
|style="background:WhiteSmoke; color:black"| | |||
Diameter: 150 mm | |||
Thickness: 0~21 mm | |||
|style="background:WhiteSmoke; color:black"| | |||
Powders | |||
|- | |||
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Optics | |||
|style="background:LightGrey; color:black"|Incident side | |||
|style="background:WhiteSmoke; color:black"| | |||
*Cross Beam Optics(CBO) | |||
*Ge(220)x2 monochromator | |||
*In-Plane Parallel Slit Collimator (PSC) | |||
*Soller slit | |||
*Variable divergence slit | |||
|style="background:WhiteSmoke; color:black"| | |||
*0.04° soller slit | |||
*Ni and Cu filter | |||
*Divergence slits | |||
*Beam mask | |||
|- | |||
|style="background:LightGrey; color:black"|Receiver side | |||
|style="background:WhiteSmoke; color:black"| | |||
*Automatic variable scattering slit | |||
*Automatic variable receiver slit | |||
*Parallel slit analysers (PSA) | |||
*Ge(220)x2 analyser | |||
|style="background:WhiteSmoke; color:black"| | |||
*0.04° soller slit | |||
*Ni filter | |||
|- | |||
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | |||
|style="background:LightGrey; color:black"|Substrate size | |||
|style="background:WhiteSmoke; color:black"| | |||
up to 150 mm wafers | |||
|style="background:WhiteSmoke; color:black"| | |||
Only for powders | |||
|- | |||
| style="background:LightGrey; color:black"|Allowed materials | |||
|style="background:WhiteSmoke; color:black"| | |||
All materials | |||
|style="background:WhiteSmoke; color:black"| | |||
All materials have to be approved | |||
|- | |||
|} | |||
<br clear="all" /> |
Revision as of 16:09, 23 March 2020
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XRD at Nanolab
We have two X-ray diffraction setups in building 346:
- The Rigaku SmartLab primarily for thin film analysis
- The XRD Powder setup primarily for analysis of bulk materials and powders
Comparison of the XRDs at Nanolab
Equipment | XRD SmartLab | XRD Powder | |
---|---|---|---|
Purpose | Crystal structure analysis and thin film thickness measurement |
|
|
X-ray generator |
Maximum rated output |
3 kW |
600 W |
Rated tube voltage |
20 to 45 kV |
40 kV | |
Rated tube current |
2 to 60 mA |
15 mA | |
Type |
Sealed tube |
Sealed tube | |
Target |
Cu |
Cu | |
Focus size |
0.4 mm x 8 mm (Line/Point) |
0.4 mm x 12 mm (Line) | |
Goniometer |
Scanning mode |
incident / receiver coupled or independent |
incident / receiver coupled |
Goniomenter radius |
300 mm |
145 mm | |
Minimum step size |
0.0001° (0.36") |
0.001° (3.6") | |
Sample stage |
|
Fixed with rotation | |
Sample size |
Diameter: 150 mm Thickness: 0~21 mm |
Powders | |
Optics | Incident side |
|
|
Receiver side |
|
| |
Substrates | Substrate size |
up to 150 mm wafers |
Only for powders |
Allowed materials |
All materials |
All materials have to be approved |