Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system: Difference between revisions

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 image:Kaempe_Lesker_standard_recipe_name.png| Deposition rate of HfO<sub>2</sub> at 150 <sup>o</sup>C. Substrate: Silicon 6" wafer with native oxide.
 </gallery>
+{| border="2" cellspacing="0" cellpadding="9"
+!colspan="1" border="none" style="background:silver; color:black;" align="center"|Recipe name
+|style="background:silver; color:black"|<b>Target material</b>
+|style="background:silver; color:black"|<b>Pressure (mTorr)</b>
+|style="background:silver; color:black"|<b>Power (W)</b>
+|style="background:silver; color:black"|<b>Deposition rate (nm/min)</b>
+|style="background:silver; color:black"|<b>Uniformity (%)<br> on 6 inch wafer</b>
+|style="background:silver; color:black"|<b>Comments</b>
+|-
+!style="background:silver; color:black;" align="center" |MD PC1 Src1 RF Upstream
+|style="background:LightGrey; color:black" align="center"|<b>SiO<sub>2</sub></b>
+|style="background:WhiteSmoke; color:black" align="center"|3
+|style="background:WhiteSmoke; color:black" align="center"|140 (RF)
+|style="background:WhiteSmoke; color:black" align="center"|2.3
+|style="background:WhiteSmoke; color:black" align="center"|0.5
+|style="background:WhiteSmoke; color:black" align="center"|
+|-
+!style="background:silver; color:black;" align="center" |MD PC1 Src2 RF Upstream
+|style="background:LightGrey; color:black" align="center"|<b>SiO<sub>2</sub></b>
+|style="background:WhiteSmoke; color:black" align="center"|3
+|style="background:WhiteSmoke; color:black" align="center"|140 (RF)
+|style="background:WhiteSmoke; color:black" align="center"|2.6
+|style="background:WhiteSmoke; color:black" align="center"|3
+|style="background:WhiteSmoke; color:black" align="center"|
+|-
+!style="background:silver; color:black;" align="center" |MD PC1 Src3 DC Upstream
+|style="background:LightGrey; color:black" align="center"|<b>Ni</b>
+|style="background:WhiteSmoke; color:black" align="center"|3
+|style="background:WhiteSmoke; color:black" align="center"|500 (DC)
+|style="background:WhiteSmoke; color:black" align="center"|23.3
+|style="background:WhiteSmoke; color:black" align="center"|2.5
+|style="background:WhiteSmoke; color:black" align="center"|
+|-
+!style="background:silver; color:black;" align="center" |MD PC1 Src4 DC Upstream
+|style="background:LightGrey; color:black" align="center"|<b>Cu</b>
+|style="background:WhiteSmoke; color:black" align="center"|3
+|style="background:WhiteSmoke; color:black" align="center"|500 (DC)
+|style="background:WhiteSmoke; color:black" align="center"|52.2
+|style="background:WhiteSmoke; color:black" align="center"|2.2
+|style="background:WhiteSmoke; color:black" align="center"|
+|-
+!style="background:silver; color:black;" align="center" |MD PC1 Src5 DC Upstream
+|style="background:LightGrey; color:black" align="center"|<b>Al</b>
+|style="background:WhiteSmoke; color:black" align="center"|3
+|style="background:WhiteSmoke; color:black" align="center"|200 (DC)
+|style="background:WhiteSmoke; color:black" align="center"|7.9
+|style="background:WhiteSmoke; color:black" align="center"|3.2
+|style="background:WhiteSmoke; color:black" align="center"|
+|-
+!style="background:silver; color:black;" align="center" |MD PC1 Src5 Pulse DC<br> Downstream with reactive O<sub>2</sub>
+|style="background:LightGrey; color:black" align="center"|<b>Cu</b>
+|style="background:WhiteSmoke; color:black" align="center"|3
+|style="background:WhiteSmoke; color:black" align="center"|500 (PDC)<br><b>Frequency:</b>100Hz<br><b>Reverse time:</b> 2µs
+|style="background:WhiteSmoke; color:black" align="center"|1.7
+|style="background:WhiteSmoke; color:black" align="center"|3.4
+|style="background:WhiteSmoke; color:black" align="center"|<b>Ar flow:</b>50sccm<br><b>O<sub>2</sub> flow:</b> 15 sccm
+|-
+!style="background:silver; color:black;" align="center" |MD PC1 Src6 Pulse DC Upstream
+|style="background:LightGrey; color:black" align="center"|<b>ITO</b>
+|style="background:WhiteSmoke; color:black" align="center"|3
+|style="background:WhiteSmoke; color:black" align="center"|140 (PDC)<br><b>Frequency:</b>100Hz<br><b>Reverse time:</b> 2µs
+|style="background:WhiteSmoke; color:black" align="center"|11
+|style="background:WhiteSmoke; color:black" align="center"|4.5
+|style="background:WhiteSmoke; color:black" align="center"|
+|-
+!style="background:silver; color:black;" align="center" |MD PC1 Src6 Pulse DC<br> Downstream with reactive O<sub>2</sub>
+|style="background:LightGrey; color:black" align="center"|<b>ITO</b>
+|style="background:WhiteSmoke; color:black" align="center"|3
+|style="background:WhiteSmoke; color:black" align="center"|140 (PDC)<br><b>Frequency:</b>100Hz<br><b>Reverse time:</b> 2µs
+|style="background:WhiteSmoke; color:black" align="center"|11.3
+|style="background:WhiteSmoke; color:black" align="center"|-
+|style="background:WhiteSmoke; color:black" align="center"|<b>Ar flow:</b>50sccm<br><b>O<sub>2</sub> flow:</b> 2 sccm
+|-
+!style="background:silver; color:black;" align="center" |MD PC1 Src1 RF Upstream
+|style="background:LightGrey; color:black" align="center"|<b>Si</b>
+|style="background:WhiteSmoke; color:black" align="center"|3
+|style="background:WhiteSmoke; color:black" align="center"|120 (RF)
+|style="background:WhiteSmoke; color:black" align="center"|1.8
+|style="background:WhiteSmoke; color:black" align="center"|-
+|style="background:WhiteSmoke; color:black" align="center"|
+|-
+!style="background:silver; color:black;" align="center" |MD PC3 Src1 Pulse DC<br> Downstream with reactive N<sub>2</sub>
+|style="background:LightGrey; color:black" align="center"|<b>Al</b>
+|style="background:WhiteSmoke; color:black" align="center"|3
+|style="background:WhiteSmoke; color:black" align="center"|900 (PDC)<br><b>Frequency:</b>100Hz<br><b>Reverse time:</b> 2µs
+|style="background:WhiteSmoke; color:black" align="center"|29
+|style="background:WhiteSmoke; color:black" align="center"|3.2
+|style="background:WhiteSmoke; color:black" align="center"|<b>Ar flow:</b>50sccm<br><b>O<sub>2</sub> flow:</b> 15 sccm
+|-
+|}