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Specific Process Knowledge/Thin film deposition/Deposition of Aluminium: Difference between revisions

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See details of the study [[/Aluminium deposition on ZEP520A for lift-off|here]].
See details of the study [[/Aluminium deposition on ZEP520A for lift-off|here]].


==Comparison of roughness and other surface characteristics for different methods of Aluminium deposition==
Studies by AFM was performed to examine differences in characteristics of the Al films, deposited with the differnt methods (sputter, e-beam, thermal). See details of the study [[/Comparison of roughness and other surface characteristics for different methods of Aluminium deposition|here]].


==Aluminium deposition on AZ5214 for lift-off==
==Aluminium deposition on AZ5214 for lift-off==
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It was tried(jan09) to lift 2,5µ Al on 4,2µ negative resist on top of 11µ Apox SiO2 in acetone sonic-bath.
It was tried(jan09) to lift 2,5µ Al on 4,2µ negative resist on top of 11µ Apox SiO2 in acetone sonic-bath.
This process was done in steps evaporating 5000Å a time with 5min pause and pressure down to at least 2E-6.
This process was done in steps evaporating 5000Å a time with 5min pause and pressure down to at least 2E-6.
==Comparison of roughness and other surface characteristics for different methods of Aluminium deposition==
Studies by AFM was performed to examine differences in characteristics of the Al films, deposited with the differnt methods (sputter, e-beam, thermal). See details of the study [[/Comparison of roughness and other surface characteristics for different methods of Aluminium deposition|here]].
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