Specific Process Knowledge/Etch/DRIE-Pegasus/picoscope: Difference between revisions
| Line 210: | Line 210: | ||
The downside of having a much more detailed view of the process is that it is very time consuming to arrive a minimum of reflected powers. Small changes in setpoints of the matching units can have dramatic impact. Quite often it is necessary to introduce shoulders on changes in gas flows to soften the transition in plasma conditions. As a result, the number of parameters in the recipes increases a lot. | The downside of having a much more detailed view of the process is that it is very time consuming to arrive a minimum of reflected powers. Small changes in setpoints of the matching units can have dramatic impact. Quite often it is necessary to introduce shoulders on changes in gas flows to soften the transition in plasma conditions. As a result, the number of parameters in the recipes increases a lot. | ||
{{Template:Peg1RecipeTableVerBColors | |||
|TableHeader=DREM 3kW | |||
}} | |||
{{Template:Peg1RecipeTableVerBAddrowColors | |||
|RecipeName=DREM 3kW 100% | |||
|PriorProcessSteps= Pump to base, Clamp Substrate, preset matching unit step | |||
|Keywords= | |||
|PlatenPosition=U |PlatenFrequency=HF |StabilisationTime=5s |StartCycleEndCycle=D/E | |||
|DepositionTime=1 |EtchTime=4 |NumberOfCycles= - | |||
|PressureDepDelay= |PressureDepBoost= |PressureDepMain=100% | |||
|PressureEtchDelay= |PressureEtchBoost= |PressureEtchMain=100% | |||
|C4F8DepDelay= |C4F8DepBoost= |C4F8DepMain=400 | |||
|C4F8EtchDelay= |C4F8EtchBoost= |C4F8EtchMain=5 | |||
|SF6DepDelay=0.3@200 |SF6DepBoost= |SF6DepMain=15 | |||
|SF6EtchDelay=1.1@15 |SF6EtchBoost=0.3@200 |SF6EtchMain=900 | |||
|O2Dep= |O2Etch= |ArDep=200 |ArEtch=3@250,250 | |||
|WCoilDep=3 |WCoilEtch=3 |WPlatenDep=0 | |||
|WPlatenEtchDelay=0.6@1 |WPlatenEtchBoost=05@300 |WPlatenEtchMain=0.1 | |||
|WClaritasDep= |WClaritasEtch= | |||
|%CoilDepLoad=40 |%CoilDepTune=50 |%CoilEtchLoad=40 |%CoilEtchTune=50 | |||
|%PlatenDepLoad=38 |%PlatenDepTune=53 |%PlatenEtchLoad=38 |%PlatenEtchTune=53 | |||
|%CLaritasLoad=L2 |%ClaritasTune=T4 |Temperature=-19 | |||
|Link2RecipeRun=[[Main Page/Process Logs/jmli/Pegasus/DREM/DREM 3kW 100% | '''1''']] | |||
}} | |||
{{Template:Peg1RecipeTableVerBAddrowColors | |||
|RecipeName=DREM 3kW 100% a | |||
|PriorProcessSteps= Pump to base, Clamp Substrate, preset matching unit step | |||
|Keywords= | |||
|PlatenPosition=U |PlatenFrequency=HF |StabilisationTime=5s |StartCycleEndCycle=D/E | |||
|DepositionTime=1 |EtchTime='''4.1''' |NumberOfCycles= - | |||
|PressureDepDelay= |PressureDepBoost= |PressureDepMain=100% | |||
|PressureEtchDelay= |PressureEtchBoost= |PressureEtchMain=100% | |||
|C4F8DepDelay= |C4F8DepBoost= |C4F8DepMain=400 | |||
|C4F8EtchDelay= |C4F8EtchBoost= |C4F8EtchMain=5 | |||
|SF6DepDelay=0.3@200 |SF6DepBoost= |SF6DepMain=15 | |||
|SF6EtchDelay='''1.2@15''' |SF6EtchBoost=0.3@200 |SF6EtchMain=900 | |||
|O2Dep= |O2Etch= |ArDep=200 |ArEtch=3@250,250 | |||
|WCoilDep=3 |WCoilEtch=3 |WPlatenDep=0 | |||
|WPlatenEtchDelay=0.6@1 |WPlatenEtchBoost='''0.6@300''' |WPlatenEtchMain=0.1 | |||
|WClaritasDep= |WClaritasEtch= | |||
|%CoilDepLoad=40 |%CoilDepTune=50 |%CoilEtchLoad=40 |%CoilEtchTune=50 | |||
|%PlatenDepLoad=38 |%PlatenDepTune=53 |%PlatenEtchLoad=38 |%PlatenEtchTune=53 | |||
|%CLaritasLoad=L2 |%ClaritasTune=T4 |Temperature=-19 | |||
|Link2RecipeRun=[[Main Page/Process Logs/jmli/Pegasus/DREM/DREM 3kW 100% a| '''1''']] | |||
}} | |||
{{Template:Peg1RecipeTableVerBAddrowColors | |||
|RecipeName=DREM 3kW 100% b | |||
|PriorProcessSteps= Pump to base, Clamp Substrate, preset matching unit step | |||
|Keywords= | |||
|PlatenPosition=U |PlatenFrequency=HF |StabilisationTime=5s |StartCycleEndCycle=D/E | |||
|DepositionTime='''1.1''' |EtchTime=4.1 |NumberOfCycles= - | |||
|PressureDepDelay= |PressureDepBoost= |PressureDepMain=100% | |||
|PressureEtchDelay= |PressureEtchBoost= |PressureEtchMain=100% | |||
|C4F8DepDelay= |C4F8DepBoost= |C4F8DepMain=400 | |||
|C4F8EtchDelay= |C4F8EtchBoost= |C4F8EtchMain=5 | |||
|SF6DepDelay=0.3@200 |SF6DepBoost= |SF6DepMain=15 | |||
|SF6EtchDelay=1.2@15 |SF6EtchBoost=0.3@200 |SF6EtchMain=900 | |||
|O2Dep= |O2Etch= |ArDep=200 |ArEtch=3@250,250 | |||
|WCoilDep=3 |WCoilEtch=3 |WPlatenDep=0 | |||
|WPlatenEtchDelay=0.6@1 |WPlatenEtchBoost=0.6@300 |WPlatenEtchMain=0.1 | |||
|WClaritasDep= |WClaritasEtch= | |||
|%CoilDepLoad=40 |%CoilDepTune=50 |%CoilEtchLoad=40 |%CoilEtchTune=50 | |||
|%PlatenDepLoad=38 |%PlatenDepTune=53 |%PlatenEtchLoad=38 |%PlatenEtchTune=53 | |||
|%CLaritasLoad=L2 |%ClaritasTune=T4 |Temperature=-19 | |||
|Link2RecipeRun=[[Main Page/Process Logs/jmli/Pegasus/DREM/DREM 3kW 100% b| '''2''']] | |||
}} | |||
|} | |||
= New recipes= | = New recipes= | ||