Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
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* '''Prepare a process flow''' which describes all steps in your UV lithography process. You can find docx-templates <u>[[Specific_Process_Knowledge/Lithography/UVLithography#Resist_Overview|in this table]]</u>. | * '''Prepare a process flow''' which describes all steps in your UV lithography process. You can find docx-templates <u>[[Specific_Process_Knowledge/Lithography/UVLithography#Resist_Overview|in this table]]</u>. | ||
* '''Design device''': Design your device and layout. A detailed instruction on how to design a layout can be found <u>[[Specific_Process_Knowledge/Pattern_Design|here]]</u>. | |||
* '''Substrate pretreatment''': In many processes it is recommended to <u>[[Specific_Process_Knowledge/Lithography/Pretreatment|pretreat or prime]]</u> your wafer before spin-coating. In some <u>[[Specific_Process_Knowledge/Lithography/Coaters|spin-coaters]]</u>, these pretreatment processes are included in the spin coating of resist. | * '''Substrate pretreatment''': In many processes it is recommended to <u>[[Specific_Process_Knowledge/Lithography/Pretreatment|pretreat or prime]]</u> your wafer before spin-coating. In some <u>[[Specific_Process_Knowledge/Lithography/Coaters|spin-coaters]]</u>, these pretreatment processes are included in the spin coating of resist. | ||
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** You can find information on dose <u>[[Specific_Process_Knowledge/Lithography/UVExposure_Dose|here]]</u>. | ** You can find information on dose <u>[[Specific_Process_Knowledge/Lithography/UVExposure_Dose|here]]</u>. | ||
* '''Mask''': | * '''Mask''': If you wish to use a mask aligner, order a photomask for your UV process. Instructions on how to order a photomask can be found <u>[[Specific_Process_Knowledge/Pattern_Design#Mask_Ordering_and_Fabrication|here]]</u>. | ||
* '''Development''': Choose which equipment you wish to use to develop your photoresist from <u>[[Specific_Process_Knowledge/Lithography/Development|this list]]</u>. Remember the development process influences the <u>[[Specific_Process_Knowledge/Lithography/UVExposure_Dose|exposure dose]]</u>. | * '''Development''': Choose which equipment you wish to use to develop your photoresist from <u>[[Specific_Process_Knowledge/Lithography/Development|this list]]</u>. Remember the development process influences the <u>[[Specific_Process_Knowledge/Lithography/UVExposure_Dose|exposure dose]]</u>. | ||