Specific Process Knowledge/Lithography: Difference between revisions
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*Manual Puddle Developer: [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=324 Developer: TMAH Manual] | *Manual Puddle Developer: [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=324 Developer: TMAH Manual] | ||
*Manual E-beam Developer: [http://labmanager.dtu.dk/d4Show.php?id=5070&mach=341 Developer: E-beam Manual] | *Manual E-beam Developer: [http://labmanager.dtu.dk/d4Show.php?id=5070&mach=341 Developer: E-beam Manual] | ||
'''<big>Process Flows</big>''' | '''<big>Process Flows</big>''' | ||
*[[:Media:Process_Flow_TPT first print.pdf|TPT first print process flow]] | *[[:Media:Process_Flow_TPT first print.pdf|TPT first print process flow]] | ||
*[[:Media:Process_Flow_TPT alignment.pdf|TPT alignment process flow]] | *[[:Media:Process_Flow_TPT alignment.pdf|TPT alignment process flow]] | ||
*[[Specific_Process_Knowledge/Lithography/UVLithography#Resist_Overview|UV resist process flows]] | |||
*[[Specific_Process_Knowledge/Lithography/EBeamLithography#E-beam_resists_and_Process_Flows|E-beam resist process flows]] | |||
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