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==Deposition of Silicon Oxide using sputter deposition technique==
==Deposition of Silicon Oxide using sputter deposition technique==
At DTU Nanolab you can also deposit silicon oxide using [[Specific Process Knowledge/Thin film deposition/Lesker|Lesker]], [[Specific Process Knowledge/Thin film deposition/Multisource PVD|PVD co-sputter/evaporation]] or [[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE Ionfab300]]
At DTU Nanolab you can also deposit silicon oxide using the Sputter System [[Specific Process Knowledge/Thin film deposition/Lesker|(Lesker)]] or the [[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE Ionfab300]]
sputter systems. One of the advantages here is that you can deposit on many kind of material.
sputter system. One of the advantages here is that you can deposit on many kinds of material.


*[[/Deposition of Silicon Oxide using Lesker sputter tool|Deposition of Silicon Oxide using Lesker sputter tool]]
*[[/Deposition of Silicon Oxide using Lesker sputter tool|Deposition of Silicon Oxide using Lesker sputter tool]]
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