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Specific Process Knowledge/Thin film deposition/Deposition of TiW/Sputtering of TiW in Wordentec/Grain size and uniformity of TiW layers: Difference between revisions

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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_TiW/Sputtering_of_TiW_in_Wordentec/Grain_size_and_uniformity_of_TiW_layers click here]'''
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==Grains in a sputtered TiW film==
==Grains and uniformity of a sputtered TiW film==


TiW films were deposited by sputtering in the Wordentec. AFM pictures show how the surface roughness is dependent on the process parameters.
TiW films were deposited by sputtering in the Wordentec. AFM pictures show how the surface roughness is dependent on the process parameters.
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