Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions
| Line 180: | Line 180: | ||
'''Result of using "Expose with substrate angle":''' | '''Result of using "Expose with substrate angle":''' | ||
*Rotation: 0.05±0.2° | *Rotation: 0.05±0.2° | ||
* | *Centering: | ||
** '''X''' -125±25µm | ** '''X''' -125±25µm | ||
** '''Y''' 104±36µm | ** '''Y''' 104±36µm | ||