Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions
| Line 185: | Line 185: | ||
*Rotation: 0.05±0.2° | *Rotation: 0.05±0.2° | ||
*Centring: | *Centring: | ||
** '''X''' 125±25µm | ** '''X''' -125±25µm | ||
** '''Y''' 104±36µm | ** '''Y''' 104±36µm | ||
Jehem Feb 2020, average of 3 4" wafers. | Jehem Feb 2020, average of 3 4" wafers. | ||