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Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,531 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,531 edits
Line 354: Line 354:
''Sequence names, process parameters, and test results (Sequence no. 2000-2999):''
''Sequence names, process parameters, and test results (Sequence no. 2000-2999):''
*'''(2410) DCH 100mm nLOF 2020 1.5um'''
*'''(2410) DCH 100mm nLOF 2020 1.5um'''
*'''(2411) DCH 100mm nLOF 2020 1.5um HMDS''' see also [[Specific_Process_Knowledge/Lithography/Coaters/Spin_Coater:_Gamma_UV_processing#Quality_Control_.28QC.29|QC]]
*'''(2411) DCH 100mm nLOF 2020 1.5um HMDS''' see also [[Specific_Process_Knowledge/Lithography/Coaters/Spin_Coater:_Gamma_UV_processing#Quality_Control_.28QC.29|'''QC''']]
*'''(2610) DCH 150mm nLOF 2020 1.5um'''
*'''(2610) DCH 150mm nLOF 2020 1.5um'''
*'''(2611) DCH 150mm nLOF 2020 1.5um HMDS'''
*'''(2611) DCH 150mm nLOF 2020 1.5um HMDS'''
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