Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions

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 ==Quality Control (QC)==
+{| border="1" cellspacing="2" cellpadding="2" colspan="3"
+|bgcolor="#98FB98" |'''Quality Control (QC) for Spin Coater: Gamma UV - AZ nLOF 2020 [[Image:section under construction.jpg|70px]] '''
+|-
+|
+*[http://labmanager.dtu.dk/d4Show.php?id=5123&mach=359 The QC procedure for Spin Coater: Gamma UV]<br>
+*[http://labmanager.dtu.dk/view_binary.php?fileId=4211 The newest QC data for Spin Coater: Gamma UV]
+{| {{table}}
+| align="center" |
+{| border="1" cellspacing="1" cellpadding="2"  align="center" style="width:200px"
+! QC Recipe:
+! (2421) DCH 100mm nLOF 2020 2um HMDS
+|-
+| Resist volume
+|3 ml
+|-
+|Spin-off speed
+|3300 rpm
+|-
+|Spin-off time
+|30 s
+|-
+|Soft bake temperature
+|110°C contact
+|-
+|Soft bake time
+|60 s
+|-
+|}
+| align="center" valign="top"|
+{| border="2" cellspacing="1" cellpadding="2" align="center" style="width:500px"
+!QC limits
+!Spin Coater: Gamma UV
+|-
+|Film thickness deviation from nominal
+|<5%
+|-
+|Film thickness non-uniformity
+|<5%
+|-
+|}
+|-
+|}
+|}
 ==HMDS priming==