Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions
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=Alignment= | =Alignment= | ||
'''This section is under construction [[Image:section under construction.jpg|70px]]''' | |||
==Top Side Alignment== | |||
'''Overlay accuracy (spec):''' 0.5µm | |||
'''Camera field of view (W x H):''' <br> | |||
'''High Res''' ??µm x ??µm <br> | |||
'''Low Res''' ??µm x ??µm <br> | |||
'''Overview''' 13mm x 10mm | |||
'''Accessible stage coordinates:''' <br> | |||
'''High/Low Res''' X = ±??mm; Y = ±??mm <br> | |||
'''Overview''' X = ±??mm; Y = +10?mm to -??mm <br> | |||
To be sure the Overview camera can be used to locate the first alignment mark, it is advised to use a mark in the bottom left portion (3<sup>rd</sup> quadrant) of the design as mark 1. <br> | |||
==Back Side Alignment== | |||
'''Overlay accuracy (spec):''' 1.0µm | |||
'''BSA windows:''' along the X and Y axes, 10mm x 46mm, starting 14.5mm from the center. | |||
'''Camera field of view (W x H):''' 640µm x 480µm | |||
<br clear="all" /> | |||
==Advanced Field alignment (TSA)== | |||
'''Overlay accuracy (spec):''' 0.25µm (5x5mm<sup>2</sup> area) | |||
Shift, rotation, scaling, and shearing is determined and set by global alignment marks. The shift is corrected by automatic alignment to one mark in each field (chip). | |||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | |||
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|-style="background:silver; color:black" | |||
!colspan="2" align="center"| | |||
!Shift (median) [nm] | |||
!Error (average) [nm] | |||
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|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|rowspan="2" align="center"|25 fields | |||
High res camera | |||
(Jehem Feb 2020) | |||
|'''X''' | |||
| | |||
| 106±55 | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|'''Y''' | |||
| | |||
| 104±56 | |||
|} | |||
<br clear="all" /> | |||