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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Line 56: Line 56:
|rowspan="2"| 1.5 µm
|rowspan="2"| 1.5 µm
| Fast
| Fast
| NA mJ/cm<sup>2</sup>
|  
| 0
|  
| NA µm
|  
| PEB: 60s@110°C, Dev: SP60s
|  
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
| Quality
| Quality
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