Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions
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The lithographic result of exposure on Aligner: Maskless 03 depends on a lot of factors, including the dose and defocus parameters, and the exposure mode used. The optimal dose and defocus depend on the type and thickness of the resist, and the optical properties of the substrate (e.g. reflective/absorbing/transparent). All of these factors influence the obtainable resolution, as well as the writing speed. | The lithographic result of exposure on Aligner: Maskless 03 depends on a lot of factors, including the dose and defocus parameters, and the exposure mode used. The optimal dose and defocus depend on the type and thickness of the resist, and the optical properties of the substrate (e.g. reflective/absorbing/transparent). All of these factors influence the obtainable resolution, as well as the writing speed. | ||