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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Line 25: Line 25:
|
|
!Thickness
!Thickness
!Laser
!Exposure mode
!Exposure mode
!Dose
!Dose
Line 35: Line 34:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!rowspan="2"| AZ 5206E
!rowspan="2"| AZ 5214E
|rowspan="2"| 0.5 µm
|rowspan="2"| 1.5 µm
|rowspan="2"| 375 nm
| Fast
| Fast
| 60 mJ/cm<sup>2</sup>
| ?? mJ/cm<sup>2</sup>
| -6
| ??
| 1 µm (not optimized)
| ?? µm (not optimized)
| Dev: 2xSP30s
| Dev: SP60s
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
| Quality
| Quality
| 60 mJ/cm<sup>2</sup>
| ?? mJ/cm<sup>2</sup>
| -6
| ??
| ~750 nm (not optimized)
| ?? (not optimized)
| Dev: 2xSP30s
|-
 
|-
|-style="background:LightGrey; color:black"
!rowspan="3"| AZ 5214E
|rowspan="3"| 1.5 µm
| 405 nm
| Fast
| 90 mJ/cm<sup>2</sup>
| -2
| 1-2 µm
| Dev: SP60s
|-style="background:LightGrey; color:black"
|rowspan="2"| 375 nm
| Fast
| 65 mJ/cm<sup>2</sup>
| 2
| ~1 µm
| Dev: SP60s
|-style="background:LightGrey; color:black"
| Quality
| 65 mJ/cm<sup>2</sup>
| 2
| ~750 nm
| Dev: SP60s
| Dev: SP60s
|-
|-
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|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!rowspan="3"| AZ MiR 701
!rowspan="2"| AZ MiR 701
|rowspan="3"| 1.5 µm
|rowspan="2"| 1.5 µm
| 405 nm
| Fast
| Fast
| 200 mJ/cm<sup>2</sup>
| ?? mJ/cm<sup>2</sup>
| -5
| ??
| ~1 µm (not optimized)
| ?? µm (not optimized)
| PEB: 60s@110°C, Dev: SP60s
| PEB: 60s@110°C, Dev: SP60s
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|rowspan="2"| 375 nm
| Quality
| Fast
| ?? mJ/cm<sup>2</sup>
| 170 mJ/cm<sup>2</sup>
| ??
| -5
| ?? (not optimized)
| 1 µm
| PEB: 60s@110°C, Dev: SP60s
| PEB: 60s@110°C, Dev: SP60s
|-style="background:WhiteSmoke; color:black"
| Quality
| 180 mJ/cm<sup>2</sup>
| -6 (Feb 2019) <br> -2 (Apr 2019)
| <750 nm
| PEB: 60s@110°C, Dev: SP60s <br> Large structures probably over-exposed
|-
|-


|-
|-
|-style="background:LightGrey; color:black"
|-style="background:WhiteSmoke; color:black"
!rowspan="2"| AZ nLOF 2020
!rowspan="2"| AZ 5214E image reversal
|rowspan="2"| 2 µm
|rowspan="2"| 2.2 µm
|rowspan="2"| 375 nm
| Fast
| Fast
| 400 mJ/cm<sup>2</sup>
| ?? mJ/cm<sup>2</sup>
| 5
| ??
| ~1 µm (not optimized)
| ?? µm (not optimized)
| PEB: 60s@110°C, Dev: SP60s <br> Probably under-exposed
| Reversal bake: 120s@110°C, Flood exposure: 200mJ/cm<sup>2</sup>, Dev: SP60s
|-style="background:LightGrey; color:black"
|-style="background:WhiteSmoke; color:black"
| Quality
| Quality
| 400 mJ/cm<sup>2</sup>
| ?? mJ/cm<sup>2</sup>
| 0
| ??
| 1 µm
| ?? (not optimized)
| PEB: 60s@110°C, Dev: SP60s <br> Probably under-exposed
| Reversal bake: 120s@110°C, Flood exposure: 200mJ/cm<sup>2</sup>, Dev: SP60s
|-
|-


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