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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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=Process Parameters=
=Process Parameters=
...
==Exposure mode==
Aligner: Maskless 03 offers two exposure modes. The exposure mode is selected during design conversion.
'''High quality (4)''' mode is used for optimal resolution and minimum stripe stitching effects.
In the high quality mode, an area of the pattern is exposed by 5 stripes, each 500µm wide and exposing a fifth of the dose. At the same time, sub-pixel interpolation is applied, yielding an address grid size of 100nm.
'''Fast''' mode is used for maximum exposure speed.
In the fast mode, each area of the pattern is exposed by 2 stripes only. This effectively cuts the exposure time in half, but also doubles the size of the address grid in the X-direction. Due to less averaging of non-uniformities, stitching effects will be more prominent in this mode.
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