Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions
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The writing head of the Aligner: Maskless 02 moves only in the z-direction. Using a pneumatic focusing system, the maskless aligner is able to do real-time autofocus. The defocus process parameter is used to compensate offsets in the focusing mechanism, and to optimize printing quality in different resists and varying thicknesses. | The writing head of the Aligner: Maskless 02 moves only in the z-direction. Using a pneumatic focusing system, the maskless aligner is able to do real-time autofocus. The defocus process parameter is used to compensate offsets in the focusing mechanism, and to optimize printing quality in different resists and varying thicknesses. | ||
The stage of the Aligner: Maskless 03 moves only in x and y. It has no theta-axis. All rotation during alignment is thus accomplished by transformation of the input design. | The stage of the Aligner: Maskless 03 moves only in x and y. It has no theta-axis. All rotation during alignment is thus accomplished by transformation of the input design. | ||
=Process Parameters= | |||