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Specific Process Knowledge/Characterization/XRD: Difference between revisions

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DCH-Employees-701, NLAB-LabmanagerAllUsers
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Khara (talk | contribs)
DCH-Employees-701, NLAB-LabmanagerAllUsers
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!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
|style="background:WhiteSmoke; color:black"|<b>XRD SmartLab</b>
|style="background:WhiteSmoke; color:black"|<b>XRD SmartLab</b>
|style="background:WhiteSmoke; color:black"|<b>XRD Powder</b>
|-
|-
!style="background:silver; color:black;" align="center" width="60"|Purpose  
!style="background:silver; color:black;" align="center" width="60"|Purpose  
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*Roughness
*Roughness
*Density
*Density
|style="background:WhiteSmoke; color:black"|
*Phase ID
*Crystal Size
*Crystallinity
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="6"|X-ray generator
!style="background:silver; color:black" align="center" valign="center" rowspan="6"|X-ray generator
Line 48: Line 53:
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
3 kW
3 kW
|style="background:WhiteSmoke; color:black"|
600 W
|-
|-
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
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|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
20 to 45 kV
20 to 45 kV
|style="background:WhiteSmoke; color:black"|
40 kV
|-
|-
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
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|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
2 to 60 mA
2 to 60 mA
|style="background:WhiteSmoke; color:black"|
15 mA
|-
|-
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
Type
Type
|style="background:WhiteSmoke; color:black"|
Sealed tube
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Sealed tube
Sealed tube
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|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
Target
Target
|style="background:WhiteSmoke; color:black"|
Cu
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Cu
Cu
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Focus size
Focus size
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
0.4x8 mm (Line/Point)
0.4 mm x 8 mm (Line/Point)
|style="background:WhiteSmoke; color:black"|
0.4 mm x 12 mm (Line)
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="5"|Goniometer
!style="background:silver; color:black" align="center" valign="center" rowspan="5"|Goniometer
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|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
incident / receiver coupled or independent
incident / receiver coupled or independent
|style="background:WhiteSmoke; color:black"|
incident / receiver coupled
|-
|-
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
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|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
300 mm
300 mm
|style="background:WhiteSmoke; color:black"|
145 mm
|-
|-
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
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|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
0.0001° (0.36")
0.0001° (0.36")
|style="background:WhiteSmoke; color:black"|
0.001° (3.6")
|-
|-
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
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*X,Y:&plusmn;50 mm for a 100 mm wafer
*X,Y:&plusmn;50 mm for a 100 mm wafer
*Rx,Ry:-5~+5°
*Rx,Ry:-5~+5°
|style="background:WhiteSmoke; color:black"|
Fixed with rotation
|-
|-
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
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Diameter: 150 mm  
Diameter: 150 mm  
Thickness: 0~21 mm
Thickness: 0~21 mm
|style="background:WhiteSmoke; color:black"|
Powders
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Optics
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Optics
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*Soller slit
*Soller slit
*Variable divergence slit
*Variable divergence slit
|style="background:WhiteSmoke; color:black"|
0.04° soller slit
Ni and Cu filter
Divergence slits
Beam mask
|-
|-
|style="background:LightGrey; color:black"|Receiver side
|style="background:LightGrey; color:black"|Receiver side
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*Parallel slit analysers (PSA)
*Parallel slit analysers (PSA)
*Ge(220)x2 analyser
*Ge(220)x2 analyser
|style="background:WhiteSmoke; color:black"|
0.04° soller slit
Ni filter
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
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|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
up to 150 mm wafers
up to 150 mm wafers
|style="background:WhiteSmoke; color:black"|
Only for powders
|-
|-
| style="background:LightGrey; color:black"|Allowed materials
| style="background:LightGrey; color:black"|Allowed materials
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
All materials
All materials
|style="background:WhiteSmoke; color:black"|
All materials have to be approved
|-  
|-  
|}
|}


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