Specific Process Knowledge/Thin film deposition/ALD2 (PEALD): Difference between revisions
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== Thermal ALD and PEALD == | == Thermal ALD and PEALD == | ||
[[image:ALD2.jpg| | [[image:ALD2.jpg|450x450px|right|thumb|ALD 2 (PEALD), positioned in cleanroom F-2.]] | ||
The ALD 2 (PEALD) is used to deposit very thin and uniform layers of different materials, by use of thermal ALD (Atomic Layer Deposition) or PEALD (Plasma Enhanced ALD). | The ALD 2 (PEALD) is used to deposit very thin and uniform layers of different materials, by use of thermal ALD (Atomic Layer Deposition) or PEALD (Plasma Enhanced ALD). | ||
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The liquid precursor sources TMA, TiCl<sub>4</sub> and H<sub>2</sub>O are stored in bottles located in a side cabinet on the left side of the machine. When the TMA and TiCl<sub>4</sub> precursors are not in use, a manual valve on each bottle has to be closed. The powder precursors SAM24 and TEMAHf are stored in bottles located in a big cabinet below the ALD chamber. These precursors are heated by heating jackets, and users should not open and close the manual valves. O<sub>3</sub> is generated by use of an ozone generator that is located in the E-rack at the right side of the machine. | The liquid precursor sources TMA, TiCl<sub>4</sub> and H<sub>2</sub>O are stored in bottles located in a side cabinet on the left side of the machine. When the TMA and TiCl<sub>4</sub> precursors are not in use, a manual valve on each bottle has to be closed. The powder precursors SAM24 and TEMAHf are stored in bottles located in a big cabinet below the ALD chamber. These precursors are heated by heating jackets, and users should not open and close the manual valves. O<sub>3</sub> is generated by use of an ozone generator that is located in the E-rack at the right side of the machine. | ||
A remote plasma generator is connected to the upper part of the reactor chamber. Different precursor gases are connected to this plasma generator through the same gas inlet. | A remote plasma generator is connected to the upper part of the reactor chamber. Different precursor gases are connected to this plasma generator through the same gas inlet. At the moment the available plasma precursor gases are N<sub>2</sub>, O<sub>2</sub>, NH<sub>3</sub> and H<sub>2</sub>. The plasma gas inlet is constantly purged with argon. The plasma gases can also be used as precursors for thermal ALD if the power to the plasma generator is not turned on. When H<sub>2</sub> is being used, the pump line constantly has to be purged with 1.9 SLM nitrogen, and this has to be enabled manually. | ||
The plasma generator is separated from the reactor chamber by a plasma cone (or chamber lid). The argon flow through the plasma gas inlet ensures that the plasma cone remains clean. | The plasma generator is separated from the reactor chamber by a plasma cone (or chamber lid). The argon flow through the plasma gas inlet ensures that the plasma cone remains clean. | ||