Jump to content

Specific Process Knowledge/Characterization/Profiler: Difference between revisions

← Older editNewer edit →
VisualWikitext
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,305 edits
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,305 edits
Line 202: Line 202:
==Optical Profiler (Filmetrics)  [[Image:section under construction.jpg|70px]]==
==Optical Profiler (Filmetrics)  [[Image:section under construction.jpg|70px]]==


[[image:|275x275px|right|thumb|Optical Profiler (Sensofar): positioned in the basement 346-900)]]
[[image:|275x275px|right|thumb|Optical Profiler (Sensofar): positioned in the basement 346-904)]]


The PLu Neox 3D Optical Profiler (from Sensofar) has a dual-technology sensor head that combines confocal and interferometry techniques as well as thick and thin film measurement capabilities.
The Profilm3D optical profiler fra Filmetrics use white-light-interferometry (WLI) and phase-shifting-interferometry (PSI) to produce surface profiles and depth-of-field color images.


The Neox sensor head provides standard microscope imaging, confocal imaging, confocal profiling, PSI (Phase Shift Interferometry), VSI (Vertical Scanning Interferometry) and high resolution thin film thickness measurements on a single instrument.
The main purpose is 3D topographic imaging of surfaces, step height measurements and roughness measurements with larger FOV (Field Of View) than the AFM, but less horisontal resolution.
 
The main purpose is 3D topographic imaging of surfaces, step height measurements in smaller trenches/holes than can be obtained with standard stylus methods (i.e. with aspect ratios higher that 1:1), roughness measurements with larger FOV (Field Of View) than the AFM, but less horisontal resolution.


For most samples the optical profiler provides fast and easy information without any sample preparation. However, it can be necessary to cover thin transparent layers (< 2 µm) with a thin layer of metal.
For most samples the optical profiler provides fast and easy information without any sample preparation. However, it can be necessary to cover thin transparent layers (< 2 µm) with a thin layer of metal.


The resolution is limited by the objectives and the pixel resolution. Also the depth of focus is limited, especially for higher magnifications.  
The resolution is limited by the objective and the sampling resolution.  




'''The user manual, technical information and contact information can be found in LabManager:'''  
'''The user manual, technical information and contact information can be found in LabManager:'''  


[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=301 Optical profiler (Sensofar) info page in LabManager]
[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=467 Optical profiler (Filmetrics) info page in LabManager]




===Process Information===
*[[/Optical Profiler (Sensofar) acceptance test|Results from the Optical Profiler (Sensofar) acceptance test]]


===Equipment performance and process related parameters===
===Equipment performance and process related parameters===
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Profiler"