Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions
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=Buffered HF-Clean= | =Buffered HF-Clean= | ||
'''Feedback to this section''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Pretreatment#Buffered_HF-Clean click here]''' | '''Feedback to this section''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Pretreatment#Buffered_HF-Clean click here]''' | ||
[[ | [[image:BHF clean.JPG|300x300px|thumb||BHF clean wetbench 04 in D-3.]] | ||
Another commonly used method to render the surface of silicon wafers hydrophobic is the dilute HF dip. | Another commonly used method to render the surface of silicon wafers hydrophobic is the dilute HF dip. | ||