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Specific Process Knowledge/Lithography/EBeamLithography/High resolution patterning with HSQ: Difference between revisions

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In most cases the time from taking HSQ out of the fridge to spin coat, and between spin coat and exposure as well as the time between exposure and development impacts on the resolution achieved.
In most cases the time from taking HSQ out of the fridge to spin coat, and between spin coat and exposure as well as the time between exposure and development impacts on the resolution achieved.
It is therefore not recommended to use HSQ as a trainings resist.
It is therefore not recommended to use HSQ as a trainings resist.
/Br
The details of the process is shown below in the table:
The details of the process is shown below in the table:
<gallery caption="Processing parameters for high resolution HSQ patterning" widths="600" heights="300" perrow="1">
<gallery caption="Processing parameters for high resolution HSQ patterning" widths="600" heights="300" perrow="1">
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