Specific Process Knowledge/Imprinting: Difference between revisions
| Line 30: | Line 30: | ||
|- | |- | ||
|-style="background: | |-style="background:WhiteSmoke; color:black" | ||
|'''Topas''' | |'''Topas''' | ||
| | | [http://www.microresist.de/en/products/nanoimprint-resists/thermal-nanoimprint-lithography/mr-i-t85-series micro resist technology] | ||
|Users may purchase own resist. | |||
| | | | ||
| | | | ||
|LabSpin03 or LabSpin03 | |LabSpin03 or LabSpin03 | ||
|IPA | |IPA | ||
| | | | ||
|- | |- | ||
|-style="background: | |-style="background:LightGrey; color:black" | ||
|'''mr-I 7030R''' | |'''mr-I 7030R''' | ||
| [http://www.microresist.de/en/products/nanoimprint-resists/thermal-nanoimprint-lithography/mr-i-7000r-series micro resist technology] | | [http://www.microresist.de/en/products/nanoimprint-resists/thermal-nanoimprint-lithography/mr-i-7000r-series micro resist technology] | ||
|We | |We purchase only mr-I 7030R, for use it please contact [mailto:Lithography@nanolab.dtu.dk Lithography]. | ||
|[[media:PI_mr_I_7000R_8000R_2017.pdf|mr-I 7030R.pdf]] | |[[media:PI_mr_I_7000R_8000R_2017.pdf|mr-I 7030R.pdf]] | ||
|mr-T 1050 | |mr-T 1050 | ||
|LabSpin03 or LabSpin03 | |LabSpin03 or LabSpin03 | ||
|Acetone | |Acetone | ||
| | |Preparation substrates with mr-I 7030R: [[media:Process_Flow_Trilayer_Ebeam_Resist.docx|Process_Flow_Trilayer_Ebeam_Resist.docx]] | ||
|} | |} | ||