Specific Process Knowledge/Imprinting: Difference between revisions
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==Imprint resist and process flows== | ==Imprint resist and process flows== | ||
{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="95%" | |||
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|-style="background:silver; color:black" | |||
|'''Resist''' | |||
|'''Manufacturer''' | |||
|'''Comments''' | |||
|'''Technical reports''' | |||
|'''Thinner''' | |||
|'''Spinner''' | |||
|'''Rinse''' | |||
|'''Process flows (in docx-format)''' | |||
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|-style="background:WhiteSmoke; color:black" | |||
|'''PMMA''' | |||
| [http://www.allresist.com AllResist] | |||
|We have various types of PMMA in the cleanroom. Please contact [mailto:Lithography@nanolab.dtu.dk Lithography] for information. | |||
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|Anisole | |||
|LabSpin03 or LabSpin03 | |||
|IPA | |||
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|-style="background:LightGrey; color:black" | |||
|'''Topas''' | |||
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|Please contact [mailto:Lithography@nanolab.dtu.dk Lithography] for information. | |||
|[[media:ZEP7000.pdf|ZEP7000.pdf]] | |||
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|LabSpin03 or LabSpin03 | |||
|IPA | |||
|Trilayer stack: [[media:Process_Flow_Trilayer_Ebeam_Resist.docx|Process_Flow_Trilayer_Ebeam_Resist.docx]] | |||
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|-style="background:WhiteSmoke; color:black" | |||
|'''mr-I 7030R''' | |||
| [http://www.microresist.de/en/products/nanoimprint-resists/thermal-nanoimprint-lithography/mr-i-7000r-series micro resist technology] | |||
|We have various types of PMMA in the cleanroom. Please contact [mailto:Lithography@nanolab.dtu.dk Lithography] for information. | |||
| | |||
|Anisole | |||
|LabSpin03 or LabSpin03 | |||
|IPA | |||
| | |||
|} | |||
== Choose an equipment == | == Choose an equipment == | ||