Jump to content

Specific Process Knowledge/Thin film deposition/Deposition of ZnO: Difference between revisions

← Older editNewer edit →
VisualWikitext
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,318 edits
No edit summary
Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
No edit summary
Line 5: Line 5:


*[[Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ZnO deposition using ALD|ZnO deposition using ALD]]
*[[Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ZnO deposition using ALD|ZnO deposition using ALD]]
 
*[[Specific Process Knowledge/Thin film deposition/Deposition of ZnO/ZnO deposition in Sputter System (Lesker)|ZnO deposition in Sputter System (Lesker)]]


{| border="1" cellspacing="0" cellpadding="4"  
{| border="1" cellspacing="0" cellpadding="4"  
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_ZnO"