Specific Process Knowledge/Lithography/Descum: Difference between revisions
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===Plasma asher 2 === | ===Plasma asher 2 === | ||
[[image:descum_graf.jpg|right|frame|355x355px|Descum results plasma asher 2 - | [[image:descum_graf.jpg|right|frame|355x355px|Descum results plasma asher 2 - recipe 1]] | ||
Descum of AZ Mir 701 resist on 100mm silicon wafer. Five wafers were placed vertically in chamber. | Descum of AZ Mir 701 resist on 100mm silicon wafer. Five wafers were placed vertically in chamber. | ||
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| ||O2 flow|| N2 flow || Power | | ||O2 flow|| N2 flow || Power | ||
|- | |- | ||
|''' | |'''recipe 1''' || 100 || 100 || 150 | ||
|- | |- | ||
|''' | |'''recipe 2''' || 500 || 0 || 200 | ||
|- | |- | ||
|} | |} | ||