Specific Process Knowledge/Thermal Process/Oxidation/Wet oxidation C1 furnace: Difference between revisions
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The Anneal Oxide furnace (C1) is the used for annealing, wet and dry oxidation of 4" and 6" wafers. | The Anneal Oxide furnace (C1) is the used for annealing, wet and dry oxidation of 4" and 6" wafers. | ||