Specific Process Knowledge/Characterization: Difference between revisions
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*[[SEM: Scanning Electron Microscopy]] | *[[SEM: Scanning Electron Microscopy]] | ||
*[[AFM: Atomic Force Microscopy]] | *[[AFM: Atomic Force Microscopy]] | ||
*[[Profiler]] | *[[Profiler]] Tencor | ||
*[[Optical microscope]] | *[[Optical microscope]] | ||
*[[Optical characterization]] | *[[Optical characterization]] ellipsometer - Filmtek - prismcoupler | ||
*[[SIMS: Secondary Ion Mass Spectrometry]] | *[[SIMS: Secondary Ion Mass Spectrometry]] | ||
*[[Dektak stylus profiler]] | *[[Dektak stylus profiler]] | ||
*Kontaktvinkel måler | |||
*4-point probe | |||
Revision as of 13:11, 20 September 2007
Choose topic
- Surface imaging
- Topographic measurement
- Stress measurement
- Filmthickness measurement
- Element analysis
- Measurement of optical constants
- Hydrophobicity measurement
- Resistivity measurement
Choose equipment
- SEM: Scanning Electron Microscopy
- AFM: Atomic Force Microscopy
- Profiler Tencor
- Optical microscope
- Optical characterization ellipsometer - Filmtek - prismcoupler
- SIMS: Secondary Ion Mass Spectrometry
- Dektak stylus profiler
- Kontaktvinkel måler
- 4-point probe