Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions
Appearance
No edit summary |
|||
| Line 226: | Line 226: | ||
===Investigation of chemical composition in multilayers system=== | ===Investigation of chemical composition in multilayers system=== | ||
Chemical tace analysis has been performed using [[Specific_Process_Knowledge/Characterization/XPS | Chemical tace analysis has been performed using [[Specific_Process_Knowledge/Characterization/XPS/K-Alpha|XPS K-Alpha]] equipment in depth profile mode. | ||
<gallery caption="" widths="1000px" heights="1000px" perrow="1"> | <gallery caption="" widths="1000px" heights="1000px" perrow="1"> | ||