Specific Process Knowledge/Lithography/Coaters: Difference between revisions
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[[image:Gamma_4M_-_E-beam_&_UV_full.JPG|400px|right|thumb|Spin Coater: Gamma E-beam & UV in E-5]] | [[image:Gamma_4M_-_E-beam_&_UV_full.JPG|400px|right|thumb|Spin Coater: Gamma E-beam & UV in E-5]] | ||
Spin Coater: Gamma E-beam and UV will be installed at | Spin Coater: Gamma E-beam and UV will be installed at DTU Nanolab in June 2017. It is a Gamma 4M cluster from Süss MicroTec with spin coating, vapour priming, and baking modules. The system handles 2", 4", and 6" wafers without size conversion, using two separate coater stations. | ||
The 2" coater station is equipped with 2 different resists lines: | The 2" coater station is equipped with 2 different resists lines: | ||