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Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
Line 246: Line 246:
[[Image:HMDS1.JPG|300x300px|thumb|The HMDS oven is placed in Cleanroom C-1.]]
[[Image:HMDS1.JPG|300x300px|thumb|The HMDS oven is placed in Cleanroom C-1.]]


At Danchip we use Star2000 model from IMTEC to do vapor deposition of hexamethyldisilizane (HMDS) under the special conditions: low pressure and high chamber temperature. The result of the dehydration bake and HMDS prime is that the wafers become hydrophobic after the treatment.  
At DTU Nanolab we use Star2000 model from IMTEC to do vapor deposition of hexamethyldisilizane (HMDS) under the special conditions: low pressure and high chamber temperature. The result of the dehydration bake and HMDS prime is that the wafers become hydrophobic after the treatment.  


'''The user manual, user APV, and contact information can be found in LabManager:'''
'''The user manual, user APV, and contact information can be found in LabManager:'''
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