Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions
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All surfaces can be divided to hydrophilic or hydrophobic surfaces. Oxidized surfaces such as SiO2 or surfaces with native oxide (e.g. Si or Al substrates) are considered to be hydrophilic and have very bad wetting with hydrophobic resist. The adhesion of most resists on hydrophilic surfaces is deteriorated if moisture is present on the surface. | All surfaces can be divided to hydrophilic or hydrophobic surfaces. Oxidized surfaces such as SiO2 or surfaces with native oxide (e.g. Si or Al substrates) are considered to be hydrophilic and have very bad wetting with hydrophobic resist. The adhesion of most resists on hydrophilic surfaces is deteriorated if moisture is present on the surface. | ||
Therefore it is very important to do the pretreatment step before the spinning. Here we will give an overview of treatments available at | Therefore it is very important to do the pretreatment step before the spinning. Here we will give an overview of treatments available at DTU Nanolab to promote photoresist adhesion. | ||
==Comparing pretreatment methods== | ==Comparing pretreatment methods== | ||