Specific Process Knowledge/Lithography: Difference between revisions
| Line 149: | Line 149: | ||
|- | |- | ||
| style="width: 20%"| | | style="width: 20%"| | ||
'''<big>[[Specific_Process_Knowledge/Lithography/UVLithography#Resist_Overview|UV resists]]</big>''' | |||
*[[Specific_Process_Knowledge/Lithography/5214E|AZ 5214E]] | |||
*[[Specific_Process_Knowledge/Lithography/4562|AZ 4562]] | |||
*[[Specific_Process_Knowledge/Lithography/MiR|AZ MiR 701 (29cps)]] | |||
*[[Specific_Process_Knowledge/Lithography/nLOF|Az nLOF 2020]] | |||
*[[Specific_Process_Knowledge/Lithography/SU-8|SU-8]] | |||
'''<big>[[Specific Process Knowledge/Lithography/Pretreatment|Pretreatment]]</big>''' | '''<big>[[Specific Process Knowledge/Lithography/Pretreatment|Pretreatment]]</big>''' | ||
*[[Specific Process Knowledge/Lithography/Pretreatment#HMDS|HMDS]] | *[[Specific Process Knowledge/Lithography/Pretreatment#HMDS|HMDS]] | ||
| Line 163: | Line 171: | ||
*[[Specific Process Knowledge/Lithography/DUVStepperLithography#SÜSS Spinner-Stepper|Spin coater: Süss Stepper]] | *[[Specific Process Knowledge/Lithography/DUVStepperLithography#SÜSS Spinner-Stepper|Spin coater: Süss Stepper]] | ||
| style="width: 20%"| | |||
'''<big>[[Specific Process Knowledge/Lithography/Baking|Baking]]</big>''' | '''<big>[[Specific Process Knowledge/Lithography/Baking|Baking]]</big>''' | ||
*[[Specific Process Knowledge/Lithography/Baking#Hotplates|Hotplates]] | *[[Specific Process Knowledge/Lithography/Baking#Hotplates|Hotplates]] | ||
*[[Specific Process Knowledge/Lithography/Baking#Ovens|Ovens]] | *[[Specific Process Knowledge/Lithography/Baking#Ovens|Ovens]] | ||
'''<big>[[Specific Process Knowledge/Lithography/UVExposure|UV Exposure]]</big>''' | '''<big>[[Specific Process Knowledge/Lithography/UVExposure|UV Exposure]]</big>''' | ||
*[[Specific Process Knowledge/Lithography/UVExposure#KS Aligner|KS Aligner]] | *[[Specific Process Knowledge/Lithography/UVExposure#KS Aligner|KS Aligner]] | ||
| Line 181: | Line 189: | ||
*[[Specific_Process_Knowledge/Lithography/EBeamLithography/JEOL_JBX-9500FSZ|E-Beam Writer 9500 (JEOL JBX-9500FSZ)]] | *[[Specific_Process_Knowledge/Lithography/EBeamLithography/JEOL_JBX-9500FSZ|E-Beam Writer 9500 (JEOL JBX-9500FSZ)]] | ||
*[[Specific_Process_Knowledge/Lithography/EBeamLithography/RaithElphy|Raith Elphy on SEM - LEO]] | *[[Specific_Process_Knowledge/Lithography/EBeamLithography/RaithElphy|Raith Elphy on SEM - LEO]] | ||
| style="width: 20%"| | |||
'''<big>[[Specific Process Knowledge/Lithography/Development|Development]]</big>''' | '''<big>[[Specific Process Knowledge/Lithography/Development|Development]]</big>''' | ||
| Line 189: | Line 199: | ||
*[[Specific_Process_Knowledge/Lithography/DUVStepperLithography#Developer_TMAH_Stepper|Developer: TMAH Stepper]] | *[[Specific_Process_Knowledge/Lithography/DUVStepperLithography#Developer_TMAH_Stepper|Developer: TMAH Stepper]] | ||
'''<big>[[Specific Process Knowledge/Lithography/Descum|Descum]]</big>''' | '''<big>[[Specific Process Knowledge/Lithography/Descum|Descum]]</big>''' | ||
*[[Specific Process Knowledge/Lithography/Strip#Plasma_asher|Plasma Asher 1]] | *[[Specific Process Knowledge/Lithography/Strip#Plasma_asher|Plasma Asher 1]] | ||