Specific Process Knowledge/Characterization/Topographic measurement: Difference between revisions
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![[Specific Process Knowledge/Characterization/Profiler#Dektak XTA_new_stylus_profiler|Dektak XTA_new stylus profiler]] | ![[Specific Process Knowledge/Characterization/Profiler#Dektak XTA_new_stylus_profiler|Dektak XTA_new stylus profiler]] | ||
![[Specific Process Knowledge/Characterization/Profiler#Optical_Profiler_(Sensofar)|Optical Profiler (Sensofar)]] | ![[Specific Process Knowledge/Characterization/Profiler#Optical_Profiler_(Sensofar)|Optical Profiler (Sensofar)]] | ||
![[Specific Process Knowledge/Characterization/Profiler#Optical_Profiler_(Filmetrics)|Optical Profiler (Filmetrics)]] | |||
![[Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy|AFM Icon]] | ![[Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy|AFM Icon]] | ||
![[Specific Process Knowledge/Characterization/Profiler#Dektak III-V Profiler|Dektak 3ST]] | ![[Specific Process Knowledge/Characterization/Profiler#Dektak III-V Profiler|Dektak 3ST]] | ||
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|Profiler for measuring micro structures. Can do wafer mapping and stress measurements. | |Profiler for measuring micro structures. Can do wafer mapping and stress measurements. | ||
|Profiler for measuring micro structures. Can do wafer mapping and stress measurements. | |Profiler for measuring micro structures. Can do wafer mapping and stress measurements. | ||
|3D Profiler for measuring micro structures and surface roughness. Can do wafer mapping. | |||
|3D Profiler for measuring micro structures and surface roughness. Can do wafer mapping. | |3D Profiler for measuring micro structures and surface roughness. Can do wafer mapping. | ||
|AFM for measuring nanostructures and surface roughness | |AFM for measuring nanostructures and surface roughness | ||
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|Depending on the objective: | |Depending on the objective: | ||
*One view: 127µmX95µm to 1270µmX955µm | *One view: 127µmX95µm to 1270µmX955µm | ||
|Only 10x objective: | |||
*Stitching: In principel a hole 6" wafer (time consuming) | *Stitching: In principel a hole 6" wafer (time consuming) | ||
|90 µm square | |90 µm square | ||
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|50Å to 1mm | |50Å to 1mm | ||
|Depending on the objective and Z resolution: | |Depending on the objective and Z resolution: | ||
*94. | *94.4 µm ->9984 µm | ||
|10 mm | |||
|1 µm (can go up to 5 µm under special settings) | |1 µm (can go up to 5 µm under special settings) | ||
|130 nm | |130 nm | ||
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|Depending on the objective: | |Depending on the objective: | ||
*0.5µm -> 5µm | *0.5µm -> 5µm | ||
|? | |||
|Depending on scan size and number of samples per line and number of lines - accuracy better than 2% | |Depending on scan size and number of samples per line and number of lines - accuracy better than 2% | ||
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*VSI down to 1 nm | *VSI down to 1 nm | ||
*Confocal (depending on objective): 1nm -> 50nm | *Confocal (depending on objective): 1nm -> 50nm | ||
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*PSI down to ? nm | |||
*VSI down to ? nm | |||
|<1Å - accuracy better than 2% | |<1Å - accuracy better than 2% | ||
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|Depending on material and trench width: | |Depending on material and trench width: | ||
*Somewhere between 1:1 and 1:12 | *Somewhere between 1:1 and 1:12 | ||
|? | |||
|~1:1 with standard cantilever. | |~1:1 with standard cantilever. | ||
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|5 µm 45<sup>o</sup> cone | |5 µm 45<sup>o</sup> cone | ||
|5 µm 45<sup>o</sup> cone | |5 µm 45<sup>o</sup> cone | ||
|No tip - using light | |||
*Blue monochromatic LED: 460nm | |||
*White broadband LED: 550nm | |||
|No tip - using light | |No tip - using light | ||
*Blue monochromatic LED: 460nm | *Blue monochromatic LED: 460nm | ||
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|Can be done | |Can be done | ||
|No stress calculation capability | |No stress calculation capability | ||
|Cannot be done | |||
|Cannot be done | |Cannot be done | ||
|Cannot be done | |Cannot be done | ||
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|Can be done on a line scan | |Can be done on a line scan | ||
|Can be done on a line scan | |Can be done on a line scan | ||
|Can be done on a line or an area | |||
|Can be done on a line or an area | |Can be done on a line or an area | ||
|Can be done on a selected surface area | |Can be done on a selected surface area | ||
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|up to 6" | |up to 6" | ||
|Up to more than 6" | |Up to more than 6" | ||
|100x100 mm | |||
|6" or less | |6" or less | ||
|4" or less | |4" or less | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!'''Allowed materials''' | !'''Allowed materials''' | ||
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*Almost any material that does not leave residual on the stage, please check the responsible group for any non standard materials | |||
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*Almost any material that does not leave residual on the stage, please check the responsible group for any non standard materials | *Almost any material that does not leave residual on the stage, please check the responsible group for any non standard materials | ||