Specific Process Knowledge/Etch/III-V ICP/InP-InGaAsP-InGaAs: Difference between revisions
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== InP etch with HBr chemistry== | == InP etch with HBr chemistry (2019)== | ||
Work done by Aurimas Sakanas @Fotonik.dtu 2019. This work was done to obtain very low surface roughness. | Work done by Aurimas Sakanas @Fotonik.dtu 2019. This work was done to obtain very low surface roughness. | ||
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</gallery> | </gallery> | ||
== InP etch with Cl2/H2 and a Si carrier wafer [[Image:section under construction.jpg|70px]] == | == InP etch with Cl2/H2 and a Si carrier wafer [[Image:section under construction.jpg|70px]] == | ||
''Work done by Berit Herstrøm @Nanolab spring 2019'' | ''Work done by Berit Herstrøm @Nanolab spring 2019'' | ||