Specific Process Knowledge/Etch/DryEtchProcessing/Comparison: Difference between revisions
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! style="background:silver; color:black" rowspan="2" | [[Specific Process Knowledge/Etch/ASE_(Advanced_Silicon_Etch)| ASE]] | ! style="background:silver; color:black" rowspan="2" | [[Specific Process Knowledge/Etch/ASE_(Advanced_Silicon_Etch)| ASE]] | ||
! style="background:silver; color:black" rowspan="2" | [[Specific Process Knowledge/Etch/AOE_(Advanced_Oxide_Etch)| AOE]] | ! style="background:silver; color:black" rowspan="2" | [[Specific Process Knowledge/Etch/AOE_(Advanced_Oxide_Etch)| AOE]] | ||
! style="background:silver; color:black" colspan="4" | [[Specific Process Knowledge/Etch/DRIE-Pegasus| DRIE-Pegasi]] | ! style="background:silver; color:black" colspan="4" align="center"| [[Specific Process Knowledge/Etch/DRIE-Pegasus| DRIE-Pegasi]] | ||
! style="background:silver; color:black" rowspan="2" | [[Specific Process Knowledge/Etch/ICP_Metal_Etcher| ICP Metal etch ]] | ! style="background:silver; color:black" rowspan="2" | [[Specific Process Knowledge/Etch/ICP_Metal_Etcher| ICP Metal etch ]] | ||
! style="background:silver; color:black" rowspan="2" | [[Specific Process Knowledge/Etch/III-V RIE |III-V RIE ]] | ! style="background:silver; color:black" rowspan="2" | [[Specific Process Knowledge/Etch/III-V RIE |III-V RIE ]] | ||