Specific Process Knowledge/Lithography/Descum: Difference between revisions
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===Plasma asher 1 === | ===Plasma asher 1 === | ||
[[image:Descum Results aug 2019.png|right|frame| Descum results plasma asher 1]] | [[image:Descum Results aug 2019.png|right|frame|400x400px| Descum results plasma asher 1]] | ||
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===Plasma asher 2 === | ===Plasma asher 2 === | ||
[[image:descum_graf.jpg|400x400px | [[image:descum_graf.jpg|right|frame|400x400px|Descum results plasma asher 2]] | ||
Descum of AZ Mir 701 resist on 100mm silicon wafer. Five wafers were placed vertically in chamber. | Descum of AZ Mir 701 resist on 100mm silicon wafer. Five wafers were placed vertically in chamber. | ||