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Specific Process Knowledge/Lithography/Descum: Difference between revisions

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Descum of AZ  Mir 701 resist on 100mm silicon wafer. Five wafers were placed vertically in chamber.
Descum of AZ  Mir 701 resist on 100mm silicon wafer. Five wafers were placed vertically in chamber.


Flow of O2 was 100
Experiment parameters
{| {{table}}
| align="center" |
{| border="1" cellspacing="1" cellpadding="2"  align="center"
|- style="background:LightGrey"
|O2 flow|| N2 flow || Power
|-
| 100 || 100 || 150
|-
|}
 
 
{| {{table}}
{| {{table}}
| align="center" |  
| align="center" |